High-power laser-produced plasma source for nanolithography

High-power laser-produced plasma source for nanolithography

Author(s):

Forber, R. A. ( JMAR Technologies, Inc. (USA) )

Gaeta, C. J. ( JMAR Technologies, Inc. (USA) )

Rieger, H. ( JMAR Technologies, Inc. (USA) )

Siegert, H. ( JMAR Technologies, Inc. (USA) )

McLeod, S. ( JMAR Technologies, Inc. (USA) )

Boerger, B. E. ( JMAR Technologies, Inc. (USA) )

1 more

Publication title:

Laser-generated and other laboratory X-ray and EUV sources, optics, and applications : 4-6 August 2003, San Diego, California, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5196

Pub. Year:

2004

Page(from):

97

Page(to):

108

Pages:

12

Pub. info.:

Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819450692 [0819450693]

Language:

English

Call no.:

P63600/5196

Type:

Conference Proceedings

Details

TDL ID:	ZA00014633
Series ID:	PA00000029
Conf. info. (Name):	Optics & Photonics : Laser-Generated and Other Laboratory X-Ray and EUV Sources, Optics, and Applications
Conf. info. (Number):	2003
Conf. info. (Venue):	San Diego, CA, USA
Conf. info. (Date):	2003.08.04-2003.08.06

Similar Items:

1 Conference Proceedings Collimated laser-plasma lithography (CPL) for 90-nm and smaller contacts and vias Forber, R., Gaeta, C., Siegert, H., McLeod, S., Boerger, B.E. SPIE - The International Society of Optical Engineering	7 Conference Proceedings High-power x-ray point source for next-generation lithography Turcu,I.C.E., Forber,R.A., Grygier,R.K., Rieger,H., Powers,M.F., Campeau,S., French,G., Foster,R.M., Mitchell,P.V., … SPIE - The International Society for Optical Engineering
2 Conference Proceedings Advances in CPL, collimated plasma source and full field exposure for sub-100-nm lithography Boerger, B.E., McLeod, S., Forber, R.A., Turcu, I.C.E., Gaeta, C.J., Bailey, D.K., Ben-Jacob, J. SPIE-The International Society for Optical Engineering	8 Conference Proceedings High-power laser-produced-plasma EUV source Ballard, W.P., Bernardez, L.J, II., Lafon, R.E., Anderson, R.J., Perras, Y.E., Leung, A.H., Shields, H., Petach, M.B., … SPIE-The International Society for Optical Engineering
3 Conference Proceedings Compact high-power laser-plasma x-ray source for lithography Gaeta,C.J., Rieger,H., Turcu,I.C.E., Forber,R.A., Campeau,S.M., Cassidy,K.L., Powers,M.F., Grygier,R.K., Maldonado,J.R., … SPIE-The International Society for Optical Engineering	9 Conference Proceedings Laser produced x-ray by high brightness and power diode pumped Nd: YAG laser for compact x-ray lithography and microscopy [6261-33] Rieger, H. SPIE - The International Society of Optical Engineering
4 Conference Proceedings High-power laser-plasma x-ray source for lithography Gaeta, C.J., Rieger, H., Turcu, I.C.E., Forber, R.A., Cassidy, K.L., Campeau, S.M., Powers, M.J., Maldonado, J.R., … SPIE-The International Society for Optical Engineering	10 Conference Proceedings High-conversion-efficiency tin material laser-plasma source for EUVL Koay, C.-S., Keyser, C.K., Takenoshita, K., Fujiwara, E., Al-Rabban, M.M., Richardson, M.C., Turcu, I.C.E., Rieger, H., … SPIE-The International Society for Optical Engineering
5 Conference Proceedings X-ray spectral measurements of the JMAR high-power laser-plasma source Whitlock, R.R., Dozier, C.M., Newman, D.A., Turcu, I.C.E., Gaeta, C.J., Cassidy, K.L., Powers, M.F., Kleindolph, T., … SPIE-The International Society for Optical Engineering	11 Conference Proceedings High-power EUV sources for lithography: a comparison of laser-produced plasma and gas-discharge-produced plasma Stamm, U., Ahmad, I., Borisov, V.M., Flohrer, F., Gaebel, K., Goetze, S., Ivanov, A.S., Khristoforov, O,B., Kloepfel, … SPIE-The International Society for Optical Engineering
6 Conference Proceedings Microfocus soft x-ray source generated by a compact high-power laser plasma Turcu,I.C.E., Rieger,H., Vladimirsky,Yu., Grygier,R.K., Powers,M.F., Naungayan,J.R., Campeau,S., French,G., Forber,R.A., … SPIE-The International Society for Optical Engineering	12 Conference Proceedings High-power EUV lithography sources based on gas discharges and laser-produced plasmas Stamm, U., Ahmad, I., Balogh, I., Birner, H., Bolshukhin, D., Brudermann, J., Enke, S., Flohrer, F., Goebel, K., Goetze, … SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12