High-resolution UV wavelength reticle contamination inspection
- Author(s):
- Kalk, F. D. ( DuPont Photomasks, Inc. (USA) )
- Volk, W. ( KLA-Tencor Corp. (USA) )
- Wiley, J. N. ( KLA-Tencor Corp. (USA) )
- Hou, E. ( KLA-Tencor Corp. (USA) )
- Watson, S. ( KLA-Tencor Corp. (USA) )
- Publication title:
- Photomask and X-Ray Mask Technology VI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3748
- Pub. Year:
- 1999
- Page(from):
- 513
- Page(to):
- 519
- Pages:
- 7
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819432308 [081943230X]
- Language:
- English
- Call no.:
- P63600/3748
- Type:
- Conference Proceedings
Similar Items:
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
9
Conference Proceedings
High-resolution ultraviolet defect inspection of DAP(darkfield alternate phase)reticles
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
5
Conference Proceedings
New die-to-database inspection algorithm for inspection of 90-nm node reticles
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |