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Reduction of fogging effect caused by scattered electrons in an electron beam system

Author(s):
Shimomura, N. ( Toshiba Corp. (Japan) )
Ogasawara, M. ( Toshiba Corp. (Japan) )
Takamatsu, J. ( Toshiba Corp. (Japan) )
Yoshitake, S. ( Toshiba Corp. (Japan) )
Ooki, K. ( Toshiba Corp. (Japan) )
Nakayamada, N. ( Toshiba Corp. (Japan) )
Okabe, F. ( Toshiba Machine Co., Ltd. (Japan) )
Tojo, T. ( Toshiba Machine Co., Ltd. (Japan) )
3 more
Publication title:
Photomask and X-Ray Mask Technology VI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3748
Pub. Year:
1999
Page(from):
408
Page(to):
415
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819432308 [081943230X]
Language:
English
Call no.:
P63600/3748
Type:
Conference Proceedings

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