Fabrication of MoSiON halftone masks using ZEP7000 for MEBES 4500
- Author(s):
Maetoko, K. ( Mitsubishi Electric Corp. (Japan) ) Tange, K. ( Mitsubishi Electric Corp. (Japan) ) Fukuma, H. ( Ryoden Semiconductor System Engineering Corp. (Japan) ) Yoshioka, N. ( Mitsubishi Electric Corp. (Japan) ) Kawada, S. ( Ulvac Coating Corp. (Japan) ) Ishizuka, M. ( Ulvac Coating Corp. (Japan) ) Sasaki, T. ( Ulvac Coating Corp. (Japan) ) Sauer, C. A. ( Etec Systems, Inc. (USA) ) - Publication title:
- Photomask and X-Ray Mask Technology VI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3748
- Pub. Year:
- 1999
- Page(from):
- 350
- Page(to):
- 357
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819432308 [081943230X]
- Language:
- English
- Call no.:
- P63600/3748
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
180-nm mask fabrication process using ZEP 7000,multipass gray,GHOST,and dry etch for MEBES 5000
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
2
Conference Proceedings
150-nm mask fabrication using thin ZEP 7000 resist,GHOST,and dry etch for the MEBES 5000 pattern generator
SPIE - The International Society for Optical Engineering |
8
Conference Proceedings
Application of charge-dissipation material in MEBES phase-shift mask fabrication
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
4
Conference Proceedings
Comparison of EBR-900 M1 and ZEP 7000 with plasma-etch processing for MEBES 4500S
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
11
Conference Proceedings
Development of advanced process for halftone phase-shift mask fabrication with electron-beam exposure systems
SPIE-The International Society for Optical Engineering |
6
Conference Proceedings
Improving CDs on a MEBES system by improving the ZEP 7000 development and dry etch process
SPIE - The International Society for Optical Engineering |
12
Conference Proceedings
Plasma etch of AZ5206/Cr and ZEP7000/Cr for 0.18- to 0.25-ヲフm-generation advanced mask fabrication
SPIE-The International Society for Optical Engineering |