Attenuated phase-shifting mask in ArF lithography
- Author(s):
Miyazaki, J. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Uematsu, M. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Nakazawa, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Matsuo, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Onodera, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Ogawa, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) - Publication title:
- Photomask and X-Ray Mask Technology VI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3748
- Pub. Year:
- 1999
- Page(from):
- 324
- Page(to):
- 331
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819432308 [081943230X]
- Language:
- English
- Call no.:
- P63600/3748
- Type:
- Conference Proceedings
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