Halftone biasing OPC technology: an approach for achieving fine bias control on raster-scan systems

Halftone biasing OPC technology: an approach for achieving fine bias control on raster-scan systems

Author(s):

Nakagawa, K. H. ( MicroUnity Systems Engineering, Inc. (USA) )

Chen, J. F. ( MicroUnity Systems Engineering, Inc. (USA) )

Socha, R. J. ( National Semiconductor Corp. (USA) )

Laidig, T. L. ( MicroUnity Systems Engineering, Inc. (USA) )

Wampler, K. E. ( MicroUnity Systems Engineering, Inc. (USA) )

Van Den Broeke, D. ( Photronics, Inc. (USA) )

Dusa, M. V. ( National Semiconductor Corp. (USA) )

Caldwell, R. F. ( MicroUnity Systems Engineering, Inc. (USA) )

3 more

Publication title:

Photomask and X-Ray Mask Technology VI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3748

Pub. Year:

1999

Page(from):

315

Page(to):

323

Pages:

9

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819432308 [081943230X]

Language:

English

Call no.:

P63600/3748

Type:

Conference Proceedings

Details

TDL ID:	ZA00014623
Series ID:	PA00000029
Conf. info. (Name):	Photomask and Next Generation Lithography Mask Technology : Photomask and X-Ray Mask Technology
Conf. info. (Number):	1999 : 6th
Conf. info. (Venue):	Yokohama, Japan
Conf. info. (Date):	1999.04.13-1999.04.14

Similar Items:

1 Conference Proceedings Manufacturing an advanced process characterization reticle incorporating halftone biasing Nakagawa,K.H., Broeke,D.Van Den, Chen,J.F., Laidig,T.L., Wampler,K.E., Caldwell,R.F. SPIE - The International Society for Optical Engineering	7 Conference Proceedings Resolution enhancement with high-transmission attenuating phase-shift masks Socha, R. J., Conley, W. E., Shi, X., Dusa, M. V., Petersen, J. S., Chen, F., Wampler, K. E., Laidig, T. L., Caldwell, … SPIE - The International Society of Optical Engineering
2 Conference Proceedings CD error sensitivity to "sub-killer" defects at k1 near 0.4:II Nakagawa,K.H., Chen,J.F., Socha,R.J., Dusa,M.V., Laidig,T.L., Wampler,K.E., Caldwell,R.F., Broeke,D.J.van den SPIE - The International Society for Optical Engineering	8 Conference Proceedings Practical technology path to sub-0.10-ｦﾌm process generations via enhanced optical lithography Chen,J.F., Laidig,T.L., Wampler,K.E., Caldwell,R.F., Nakagawa,K.H., Liebchen,A. SPIE - The International Society for Optical Engineering
3 Conference Proceedings Making high-performance scattering-bar OPC masks with vector-scan,variable-shaped e-beam,and raster-scan laser mask writers Lu,H.H., Hwang,R., Lee,V., Chen,J.F., Laidig,T.L., Wampler,K.E., Caldwell,R.F. SPIE - The International Society for Optical Engineering	9 Conference Proceedings Model-based scattering bars implementation for 65nm and 45nm nodes using IML technology [5853-50] Hsu, M., Van Den Broeke, D., Laidig, T., Wampler, K. E., Hollerbach, U., Socha, R., Chen, J. F., Hsu, S., Shi, X. SPIE - The International Society of Optical Engineering
4 Conference Proceedings OPC technology road map to 0.14-ｦﾌm design rules Chen,J.F., Laidig,L., Wampler,K.E., Caldwell,R.F., Naderi,A.R., Van Den Broeke,D. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Application of CPL with Interference Mapping Lithography to generate random contact reticle designs for the 65-nm node Van Den Broeke, D.J., Laidig, T.L., Chen, J.F., Wampler, K.E., Hsu, S.D., Shi, X., Socha, R.J., Dusa, M.V., Corcoran, … SPIE - The International Society of Optical Engineering
5 Conference Proceedings Contact and via hole mask design optimization for 65-nm technology node Van Den Broeke, D., Shi, X., Socha, R., Laidig, T., Hollerbach, U., Wampler, K. E., Hsu, S., Chen, J. F., Corcoran, N. … SPIE - The International Society of Optical Engineering	11 Conference Proceedings Complex 2D pattern lithography at λ/4 resolution using chromeless phase lithography (CPL) Van Den Broeke, D.J., Chen, J.F., Laidig, T.L., Hsu, S.D., Wampler, K.E., Socha, R.J., Petersen, J.S. SPIE-The International Society for Optical Engineering
6 Conference Proceedings Binary halftone chromeless PSM technology for λ/4 optical lithography Chen,J.F., Petersen,J.S., Socha,R.J., Laidig,T.L., Wampler,K.E., Nakagawa,K.H., Hughes,G.P., MacDonald,S.S., Ng,W. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Near-0.3 k1 full pitch range contact hole patterning using chromeless phase lithography (CPL) Van Den Broeke, D.J., Socha, R., Hsu, S.D., Chen, J.F., Laidig, T.L., Corcoran, N., Hollerbach, U., Wampler, K.E., Shi, … SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12