Blank Cover Image

Plasma etching of Cr: a multiparameter uniformity study utilizing patterns of various Cr loads

Author(s):
Publication title:
Photomask and X-Ray Mask Technology VI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3748
Pub. Year:
1999
Page(from):
153
Page(to):
157
Pages:
5
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819432308 [081943230X]
Language:
English
Call no.:
P63600/3748
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Plasma etch of binary Cr masks:CD uniformity study of photomasks utilizing varying Cr loads

Constantine,C., Westerman,R.J., Plumhoff,J.

SPIE - The International Society for Optical Engineering
7 Conference Proceedings Quartz etch process to improve etch depth linearity and uniformity using Mask Etcher IV

Srinivasan, S., Plumhoff, J., Westerman, R., Johnson, D. J., Constantine, C.

SPIE - The International Society of Optical Engineering
2 Conference Proceedings Plasma etch of binary Cr masks: CD uniformity study of photomasks utilizing varying Cr loads: ？

Constantine,C., Westerman,R.J., Plumhoff,J.

SPIE-The International Society for Optical Engineering
8 Conference Proceedings Plasma etching of Cr photomasks: optimization of process conditions and CD control

Constantine,C., Johnson,D.J., Westerman,R.J., Coleman,T.P., Faure,T., Dubuque,L.F.

SPIE-The International Society for Optical Engineering
3 Conference Proceedings Plasma etching of quartz for the fabrication of alternating aperture phase-shift photomasks: etch rate uniformity study utilizing a next-generation ICP source

Westerman,R.J., Constantine,C., Plumhoff,J., Strawn,C.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Quartz etch process for alternating aperture phase shift masks (alt-APSM) [5853-20]

Srinivasan, S., Westerman, R., Plumhoff, J., Johnson, D., Constantine, C.

SPIE - The International Society of Optical Engineering
4 Conference Proceedings Controlling CD uniformity for 45nm technology node applications [6349-10]

Plumhoff, J., Srinivasan, S., Westerman, R., Johnson, D., Constantine, C.

SPIE - The International Society of Optical Engineering
10 Conference Proceedings Improvements in MoSi EAPSM CD bias and iso-dense linearity plasma etch results utilizing design of experiments process optimization of Gen III ICP plasma …

Plumhoff, J., Constantine, C., Shin, J., Rausa, E.

SPIE-The International Society for Optical Engineering
5 Conference Proceedings Investigation of quartz etch rate uniformity for alternating phase-shift mask applications utillzing a next-generation ICP source

Strawn,C., Constantine,C., Plumhoff,J., Westerman,R.J.

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Binary Cr etch process control directed at the 45nm node [6283-25]

Plumhoff, J., Westernman, R., Constantine, C.

SPIE - The International Society of Optical Engineering
6 Conference Proceedings Plasma etching of Cr photomasks:parametric comparisons of plasma sources and process conditions

Constantine,C., Johnson,D.J., Westerman,R.J., Coleman,T.P., Faure,T.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings Achieving 65-nm design rule dry etch performance: a study of CD bias, uniformity, and linearity on binary chrome photomasks

Plumhoff, J., Constantine, C., Reelfs, B.H.

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12