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Evaluation of NLD mask dry etching system

Author(s):
Fujisawa, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Iwamatsu, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Hiruta, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Morimoto, H. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Sasaki, T. ( ULVAC Coating Corp. (Japan) )
Yamashiro, K. ( HOYA Corp. (Japan) )
1 more
Publication title:
Photomask and X-Ray Mask Technology VI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3748
Pub. Year:
1999
Page(from):
147
Page(to):
152
Pages:
6
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819432308 [081943230X]
Language:
English
Call no.:
P63600/3748
Type:
Conference Proceedings

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