Enhanced pattern fidelity experiment for subquarter-micron design rule mask making
- Author(s):
- Kim, D. Y. ( DuPont Photomasks Korea Ltd. )
- Shin, C. ( DuPont Photomasks Korea Ltd. )
- Jung, H. S. ( DuPont Photomasks Korea Ltd. )
- Cho, J. S. ( DuPont Photomasks Korea Ltd. )
- Publication title:
- Photomask and X-Ray Mask Technology VI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3748
- Pub. Year:
- 1999
- Page(from):
- 101
- Page(to):
- 114
- Pages:
- 14
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819432308 [081943230X]
- Language:
- English
- Call no.:
- P63600/3748
- Type:
- Conference Proceedings
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