Comparative evaluation results of CMS replacement resist for e-beam reticle fabrication

Author(s):

• Kobayashi, H. ( HOYA Corp. (Japan) )
• Higuchi, T. ( HOYA Corp. (Japan) )
• Asakawa, K. ( HOYA Corp. (Japan) )
• Yokoya, Y. ( HOYA Corp. (Japan) )
• Wada, T. ( HOYA Corp. (Japan) )

Publication title:

Photomask and X-Ray Mask Technology VI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3748

Pub. Year:

1999

Page(from):

69

Page(to):

78

Pages:

10

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819432308 [081943230X]

Language:

English

Call no.:

P63600/3748

Type:

Conference Proceedings