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Process optimization of a negative-tone CVD photoresist for 193-nm lithography applications

Author(s):
Joubert, O. P. ( France Telecom CNET-CNS and Lab. des Technologies de la Microelectronique (France) )
Fuard, D. ( France Telecom CNET-CNS and Lab. des Technologies de la Microelectronique (France) )
Monget, C. ( France Telecom CNET-CNS )
Schiavone, P. ( France Telecom CNET-CNS )
Toublan, O. ( France Telecom CNET-CNS )
Prola, A. ( France Telecom CNET-CNS )
Temerson, J. M. ( France Telecom CNET-CNS )
Inglebert, R. L. ( Univ. d'Orleans (France) )
Weidman, T. W. ( Applied Materials, Inc. )
Nault, M. P. ( Applied Materials, Inc. )
Bekiaris, N. ( Applied Materials, Inc. )
6 more
Publication title:
Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3678
Pub. Year:
1999
Page(from):
1371
Page(to):
1380
Pages:
10
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819431523 [0819431524]
Language:
English
Call no.:
P63600/3678-2
Type:
Conference Proceedings

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