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Improved resolution with advanced negative DUV photoresist with 0.26N capability

Author(s):
Prokopowicz, G. P. ( Shipley Co. Inc. )
Georger, J. H. Jr. ( Shipley Co. Inc. )
Ayyash, E. ( Shipley Co. Inc. )
Thackeray, J. W. ( Shipley Co. Inc. )
Brunsvold, W. R. ( IBM Microelectronics Div. )
Kosbar, L. L. ( IBM Thomas J. Watson Research Ctr. )
Afzali, A. ( IBM Thomas J. Watson Research Ctr. )
Gelorme, J. D. ( IBM Thomas J. Watson Research Ctr. )
3 more
Publication title:
Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3678
Pub. Year:
1999
Page(from):
1284
Page(to):
1295
Pages:
12
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819431523 [0819431524]
Language:
English
Call no.:
P63600/3678-2
Type:
Conference Proceedings

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