Optical lithography simulation and photoresist optimization for photomask fabrication

Optical lithography simulation and photoresist optimization for photomask fabrication

Author(s):

Rathsack, B. M. ( Univ. of Texas at Austin )

Tabery, C. E. ( Univ. of Texas at Austin )

Scheer, S. A. ( Univ. of Texas at Austin )

Pochkowski, M. ( Etec Systems, Inc. )

Philbin, C. E. ( DuPont Photomasks, Inc. )

Kalk, F. D. ( DuPont Photomasks, Inc. )

Henderson, C. L. ( Georgia Institute of Technology )

Buck, P. D. ( DuPont Photomasks, Inc. )

Willson, C. G. ( Univ. of Texas at Austin )

4 more

Publication title:

Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3678

Pub. Year:

1999

Page(from):

1215

Page(to):

1226

Pages:

12

Pub. info.:

Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819431523 [0819431524]

Language:

English

Call no.:

P63600/3678-2

Type:

Conference Proceedings

Details

TDL ID:	ZA00014621
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Microlithography
Conf. info. (Number):	1999 : 16th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1999.03.15-1999.03.17

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