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Evaluation of electron-beam stabilization for ion implant processing

Author(s):
Buffat, S. J. ( ZiLOG )
Kickel, B. ( ZiLOG )
Philipps, B. ( ZiLOG )
Adams, J. ( ZiLOG )
Ross, M. F. ( AlliedSignal Inc. )
Minter, J. P. ( AlliedSignal Inc. )
Marlowe, T. ( AlliedSignal Inc. )
Wong, S. S. ( AlliedSignal Inc. )
3 more
Publication title:
Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3678
Pub. Year:
1999
Page(from):
1157
Page(to):
1174
Pages:
18
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819431523 [0819431524]
Language:
English
Call no.:
P63600/3678-2
Type:
Conference Proceedings

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