Color filter array for CCD and CMOS image sensors using a chemically amplified thermally cured pre-dyed positive-tone photoresist for 365-nm lithography

Color filter array for CCD and CMOS image sensors using a chemically amplified thermally cured pre-dyed positive-tone photoresist for 365-nm lithography

Author(s):: Miller, H. R. ( Digital Optics Corp. )
Publication title:: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California
Title of ser.:: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:: 3678
Pub. Year:: 1999
Page(from):: 1083
Page(to):: 1090
Pages:: 8
Pub. info.:: Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
ISSN:: 0277786X
ISBN:: 9780819431523 [0819431524]
Language:: English
Call no.:: P63600/3678-2
Type:: Conference Proceedings

Details

TDL ID:	ZA00014621
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Microlithography
Conf. info. (Number):	1999 : 16th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1999.03.15-1999.03.17

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