Effects of amines on postlithographic photo and thermal curing of deep-UV resists
- Author(s):
- Mohondro, R. D. ( Eaton Corp. )
- Hallock, J. S. ( Eaton Corp. )
- Berry, I. L. ( Eaton Corp. )
- Martinez, R. A. ( Eaton Corp. )
- Publication title:
- Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3678
- Pub. Year:
- 1999
- Page(from):
- 1012
- Page(to):
- 1022
- Pages:
- 11
- Pub. info.:
- Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819431523 [0819431524]
- Language:
- English
- Call no.:
- P63600/3678-2
- Type:
- Conference Proceedings
Similar Items:
American Chemical Society |
SPIE-The International Society for Optical Engineering |
2
Conference Proceedings
Novel approach for the photostabilization of chemically amplified photoresists
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
10
Conference Proceedings
PRECURSORS TO THE PHOTO-ABLATION OF SODIUM TRISILICATE GLASS DUE TO UV EXCIMER IRRADIATION
Materials Research Society |
MRS - Materials Research Society |
11
Conference Proceedings
High aspect ratio grating fabrication in SU-8 resist by UV-curing nanoimprint
Society of Photo-optical Instrumentation Engineers |
6
Conference Proceedings
B Adhesion between template materials and UV -cured nanoimprint resists [6153-48]
SPIE - The International Society of Optical Engineering |
12
Conference Proceedings
Characterization of resists and antireflective coatings by spectroscopic ellipsometry in the UV and deep-UV range
SPIE-The International Society for Optical Engineering |