Effect of developer temperature and normality on chemically amplified photoresist dissolution
- Author(s):
- Maslow, M. J. ( FINLE Technologies, Inc. )
- Mack, C. A. ( FINLE Technologies, Inc. )
- Byers, I. D. ( International SEMATECH )
- Publication title:
- Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3678
- Pub. Year:
- 1999
- Page(from):
- 1001
- Page(to):
- 1011
- Pages:
- 11
- Pub. info.:
- Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819431523 [0819431524]
- Language:
- English
- Call no.:
- P63600/3678-2
- Type:
- Conference Proceedings
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