Selection of attenuated phase shift mask compatible contact hole resists for KrF optical lithography
- Author(s):
Lu, Z. G. ( Seimens Microelectronics ) Cui, Y. ( IBM Microelectronics Div. ) Thomas, A. C. ( IBM Microelectronics Div. ) Mansfield, S. M. ( IBM Microelectronics Div. ) Kunkel, G. ( Siemens Microelectronics ) Dobuzinsky, D. ( IBM Microelectronics Div. ) Zach, F. X. ( IBM Microelectronics Div. ) Liu, D. ( Siemens Microelectronics ) Chen, K. -J. R. ( IBM Microelectronics Div. ) Jordhamo, G. ( IBM Microelectronics Div. ) Cutmann, A. ( Siemens Microelectronics ) Farrell, T. R. ( IBM Microelectronics Div. ) - Publication title:
- Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3678
- Pub. Year:
- 1999
- Page(from):
- 923
- Page(to):
- 934
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819431523 [0819431524]
- Language:
- English
- Call no.:
- P63600/3678-2
- Type:
- Conference Proceedings
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