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Simple method for measuring acid generation quantum efficiency at 193nm

Author(s):
Szmanda, C. R. ( Shipley Co. Inc. )
Kavanagh, R. J. ( Shipley Co. Inc. )
Bohland, J. R. ( Shipley Co. Inc. )
Cameron, J. F. ( Shipley Co. Inc. )
Trefonas, P. ( Shipley Co. Inc. )
Blacksmith, R. F. ( Shipley Co. Inc. )
1 more
Publication title:
Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3678
Pub. Year:
1999
Page(from):
857
Page(to):
866
Pages:
10
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819431523 [0819431524]
Language:
English
Call no.:
P63600/3678-2
Type:
Conference Proceedings

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