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Recent progress in 193-nm antireflective coatings

Author(s):
Meador, J. D. ( Brewer Science, Inc. )
Guerrero, D. J. ( Brewer Science, Inc. )
Xu, G. ( Brewer Science, Inc. )
Shao, X. ( Brewer Science, Inc. )
Dobson, N. ( Brewer Science, Inc. )
Claypool, J. ( Brewer Science, Inc. )
Nowak, K. ( Brewer Science, Inc. )
2 more
Publication title:
Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3678
Pub. Year:
1999
Page(from):
800
Page(to):
809
Pages:
10
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819431523 [0819431524]
Language:
English
Call no.:
P63600/3678-2
Type:
Conference Proceedings

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