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Design of acid labile protecting groups in chemically amplified resists

Author(s):
Fujita, J. ( Mitsubishi Chemical Corp. (Japan) )
Sasaki, K. ( Mitsubishi Chemical Corp. (Japan) )
Kameyama, Y. ( Mitsubishi Chemical Corp. (Japan) )
Chika, Y. ( Mitsubishi Chemical Corp. (Japan) )
Kashiwagi, T. ( Mitsubishi Chemical Corp. (Japan) )
Niinomi, T. ( Mitsubishi Chemical Corp. (Japan) )
Tanaka, Y. ( Mitsubishi Chemical Corp. (Japan) )
Tarutani, S. ( Mitsubishi Chemical Corp. (Japan) )
Ochiai, T. ( Mitsubishi Chemical Corp. (Japan) )
4 more
Publication title:
Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3678
Pub. Year:
1999
Page(from):
608
Page(to):
616
Pages:
9
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819431523 [0819431524]
Language:
English
Call no.:
P63600/3678-1
Type:
Conference Proceedings

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