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Chemically amplified negative resist optimized for high-resolution x-ray lithography

Author(s):
  • Nakamura, J. ( NTT System Electronics Labs. (Japan) )
  • Kawai, Y. ( NTT System Electronics Labs. (Japan) )
  • Deguchi, K. ( NTT System Electronics Labs. (Japan) )
  • Oda, M. ( NTT System Electronics Labs. (Japan) )
  • Matsuda, T. ( NTT System Electronics Labs. (Japan) )
Publication title:
Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3678
Pub. Year:
1999
Page(from):
455
Page(to):
462
Pages:
8
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819431523 [0819431524]
Language:
English
Call no.:
P63600/3678-1
Type:
Conference Proceedings

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