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Characterization and lithographic parameter extraction for the modified resists

Author(s):
Ko, F. -H. ( National Chiao Tung Univ. (Taiwan) )
Lu, J. -K. ( National Tsing Hua Univ. (Taiwan) )
Chu, T. -C. ( National Tsing Hua Univ. (Taiwan) )
Huang, T. -Y. ( National Chiao Tung Univ. (Taiwan) )
Yang, C. -C. ( National Chiao Tung Univ. (Taiwan) )
Sheu, J. -T. ( National Chiao Tung Univ. (Taiwan) )
Huang, H. -L. ( Industrial Technology Research Institute (Taiwan) )
2 more
Publication title:
Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3678
Pub. Year:
1999
Page(from):
429
Page(to):
439
Pages:
11
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819431523 [0819431524]
Language:
English
Call no.:
P63600/3678-1
Type:
Conference Proceedings

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