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Chemically amplified resist based on the methacrylate polymer with 2-trimethylsilyl-2-propyl ester protecting group

Author(s):
  • Kim, J. -B. ( Korea Advanced Institute of Science and Technology )
  • Kim, H. ( Korea Advanced Institute of Science and Technology )
  • Lee, S. -H. ( Samsung Electronics Co., Ltd. (Korea) )
  • Choi, S. -J. ( Samsung Electronics Co., Ltd. (Korea) )
  • Moon, J. -T. ( Samsung Electronics Co., Ltd. (Korea) )
Publication title:
Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3678
Pub. Year:
1999
Page(from):
420
Page(to):
428
Pages:
9
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819431523 [0819431524]
Language:
English
Call no.:
P63600/3678-1
Type:
Conference Proceedings

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