Lithographic properties of novel acetal-derivatized hydroxy styrene polymers
- Author(s):
Malik, S. ( Arch Chemicals, Inc. ) Blakeney, A. J. ( Arch Chemicals, Inc. ) Ferreira, L. ( Arch Chemicals, Inc. ) Maxwell, B. ( Arch Chemicals, Inc. ) Whewell, A. ( Arch Chemicals, Inc. ) Sarubbi, T. R. ( Arch Chemicals, Inc. ) Bowden, M. J. ( Arch Chemicals, Inc. ) Driessche, V. Van ( Arch Chemicals, N.V. (Belgium) ) Fujimori, T. ( Fuji Photo Film Co., Ltd. (Japan) ) Tan, S. ( Fuji Photo Film Co., Ltd. (Japan) ) Aoai, T. ( Fuji Photo Film Co., Ltd. (Japan) ) Uenishi, K. ( Fuji Photo Film Co., Ltd. (Japan) ) Kawabe, Y. ( Fuji Photo Film Co., Ltd. (Japan) ) Kokubo, T. ( Fuji Film-Olin Co., Ltd. (Japan) ) - Publication title:
- Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3678
- Pub. Year:
- 1999
- Page(from):
- 388
- Page(to):
- 401
- Pages:
- 14
- Pub. info.:
- Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819431523 [0819431524]
- Language:
- English
- Call no.:
- P63600/3678-1
- Type:
- Conference Proceedings
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