Analysis of molecular diffusion in resist polymer films simulated by molecular dynamics
- Author(s):
- Toriumi, M. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
- Ohfuji, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
- Endo, M. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
- Morimoto, H. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
- Publication title:
- Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3678
- Pub. Year:
- 1999
- Page(from):
- 368
- Page(to):
- 379
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819431523 [0819431524]
- Language:
- English
- Call no.:
- P63600/3678-1
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Temperature dependence of acid molecular diffusion in resist polymer films simulated by molecular dynamics
SPIE - The International Society for Optical Engineering |
7
Conference Proceedings
A study of EUV resist outgassing characteristics using a novel outgas analysis system
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
8
Conference Proceedings
Dry etching resistance of methacrylate polymers for ArF excimer laser lithography
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
9
Conference Proceedings
Recent advantages of bilevel resists based on silsesquioxane for ArF lithography
SPIE-The International Society for Optical Engineering |
4
Conference Proceedings
Dissolution-rate analysis of ArF resist polymers based on the percolation model
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
5
Conference Proceedings
Dissolution chracteristics of resist polymers studied by quartz crystal microbalance transmission-line analysis and pKa acidity analysis
SPIE-The International Society for Optical Engineering |
11
Conference Proceedings
Novel alkaline-soluble alicyclic polymer poly(TCDMACOOH)for ArF chemically amplified positive resists
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |