Correlations between dissolution data and lithography of various resists
- Author(s):
- DellaGuardia, R. ( IBM Microeiectronics Div. )
- Huang, W. -S. ( IBM Microeiectronics Div. )
- Chen, K. -J. R. ( IBM Microeiectronics Div. )
- Kang, D. ( Shipley Co. Inc. )
- Publication title:
- Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3678
- Pub. Year:
- 1999
- Page(from):
- 316
- Page(to):
- 328
- Pages:
- 13
- Pub. info.:
- Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819431523 [0819431524]
- Language:
- English
- Call no.:
- P63600/3678-1
- Type:
- Conference Proceedings
Similar Items:
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
11
Conference Proceedings
Edge lithography as a means of extending the limits of optical and nonoptical lithographic resolution
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
12
Conference Proceedings
Evaluation of an advanced chemically amplified resist for next-generation lithography mask fabrication
SPIE-The International Society for Optical Engineering |