High-resolution 248-nm bilayer resist
- Author(s):
Lin, Q. ( IBM Thomas J. Watson Research Ctr. ) Petrillo, K. E. ( IBM Thomas J. Watson Research Ctr. ) Babich, K. ( IBM Thomas J. Watson Research Ctr. ) Tulipe, D. C. La ( IBM Thomas J. Watson Research Ctr. ) Medeiros, D. ( IBM Thomas J. Watson Research Ctr. ) Mahorowala, A. ( IBM Thomas J. Watson Research Ctr. ) Simons, J. P. ( IBM Thomas J. Watson Research Ctr. ) Angelopoulos, M. ( IBM Thomas J. Watson Research Ctr. ) Wallraff, G. M. ( IBM Almaden Research Ctr. ) Larson, C. E. ( IBM Almaden Research Ctr. ) Fenzel-Alexander, D. ( IBM Almaden Research Ctr. ) Sooriyakumaran, R. ( IBM Almaden Research Ctr. ) Breyta, G. ( IBM Almaden Research Ctr. ) Brock, P. J. ( IBM Almaden Research Ctr. ) DiPietro, R. A. ( IBM Almaden Research Ctr. ) Hofer, D. C. ( IBM Almaden Research Ctr. ) - Publication title:
- Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3678
- Pub. Year:
- 1999
- Page(from):
- 241
- Page(to):
- 250
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819431523 [0819431524]
- Language:
- English
- Call no.:
- P63600/3678-1
- Type:
- Conference Proceedings
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