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Aerial image contrast using interferometric lithography: effect on line-edge roughness

Author(s):
Sanchez, M. I. ( IBM Almaden Research Ctr. )
Hinsberg, W. D. ( IBM Almaden Research Ctr. )
Houle, F. A. ( IBM Almaden Research Ctr. )
Hoffnagle, J. A. ( IBM Almaden Research Ctr. )
Ito, H. ( IBM Almaden Research Ctr. )
Nguyen, C. ( IBM Almaden Research Ctr. )
1 more
Publication title:
Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3678
Pub. Year:
1999
Page(from):
160
Page(to):
173
Pages:
14
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819431523 [0819431524]
Language:
English
Call no.:
P63600/3678-1
Type:
Conference Proceedings

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