Design and development of high-performance 193-nm positive resist based on functionalized poly(cyclicolefins)

Design and development of high-performance 193-nm positive resist based on functionalized poly(cyclicolefins)

Author(s):

Varanasi, P. R. ( IBM Microelectronics Div. )

Maniscalco, J. ( IBM Microelectronics Div. )

Mewherter, A. M. ( IBM Microelectronics Div. )

Lawson, M. C. ( IBM Microelectronics Div. )

Jordhamo, G. ( IBM Microelectronics Div. )

Allen, R. D. ( IBM Almaden Research Ctr. )

Opitz, J. ( IBM Almaden Research Ctr. )

Ito, H. ( IBM Almaden Research Ctr. )

Wallow, T. I. ( IBM Almaden Research Ctr. )

Hofer, D. C. ( IBM Almaden Research Ctr. )

Langsdorf, L. ( BFGoodrich )

Jayaraman, S. ( BFGoodrich )

Vicari, R. ( BFGoodrich )

8 more

Publication title:

Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3678

Pub. Year:

1999

Page(from):

51

Page(to):

65

Pages:

15

Pub. info.:

Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819431523 [0819431524]

Language:

English

Call no.:

P63600/3678-1

Type:

Conference Proceedings

Details

TDL ID:	ZA00014620
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Microlithography
Conf. info. (Number):	1999 : 16th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	1999.03.15-1999.03.17

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