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Development of an incremental structural parameter model for predicting reactive ion etch rates of 193-nm photoresist polymer platforms

Author(s):
Wallow, T. I. ( IBM Almaden Research Ctr. )
Brock, P. J. ( IBM Almaden Research Ctr. )
DiPietro, R. A. ( IBM Almaden Research Ctr. )
Allen, R. D. ( IBM Almaden Research Ctr. )
Opitz, J. ( IBM Almaden Research Ctr. )
Sooriyakumaran, R. ( IBM Almaden Research Ctr. )
Hofer, D. C. ( IBM Almaden Research Ctr. )
Mewherter, A. M. ( IBM Microelectronics Div. )
Cui, Y. ( IBM Microelectronics Div. )
Yan, W. ( IBM Microelectronics Div. )
Worth, G. ( IBM Microelectronics Div. )
Moreau, W. M. ( IBM Microelectronics Div. )
Meute, J. ( International SEMATECH )
Byers, J. D. ( International SEMATECH )
Rich, G. K. ( International SEMATECH )
McCallum, M. ( International SEMATECH )
Jayaraman, S. ( BFGoodrich )
Vicari, R. ( BFGoodrich )
Cagle, J. ( BFGoodrich )
Sun, S. ( BFGoodrich )
Hullihen, K. A. ( BFGoodrich )
16 more
Publication title:
Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3678
Pub. Year:
1999
Page(from):
26
Page(to):
35
Pages:
10
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819431523 [0819431524]
Language:
English
Call no.:
P63600/3678-1
Type:
Conference Proceedings

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