Blank Cover Image

Chemically amplified resists: past, present, and future (Invited Paper)

Author(s):
Ito, H. ( IBM Almaden Research Ctr. )  
Publication title:
Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3678
Pub. Year:
1999
Page(from):
2
Page(to):
12
Pages:
11
Pub. info.:
Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819431523 [0819431524]
Language:
English
Call no.:
P63600/3678-1
Type:
Conference Proceedings

Similar Items:

Tropf, W.J., Thomas, M.E., Frazer, R.K.

SPIE-The International Society for Optical Engineering

Rolland, J. P., Cakmakci, O.

SPIE - The International Society of Optical Engineering

Ito, H., Sherwood, M.

SPIE - The International Society of Optical Engineering

Douglas A. Simons, Joseph B. Jensen, Celine d'Orgeville, Peter M. Gray, Manuel Lazo, Rolando Rogers, Michael P. Sheehan, …

SPIE - The International Society of Optical Engineering

H. Ito

Society of Photo-optical Instrumentation Engineers

Maynard, J. A., Begley, D.

SPIE - The International Society of Optical Engineering

10 Conference Proceedings Past, present and future of phosensitisers

Pottier H. R.

Springer-Verlag

McCann,J.J.

SPIE-The International Society for Optical Engineering

Ito, Hiroshi

American Chemical Society

Sandland,P.

SPIE-The International Society for Optical Engineering

M. Sakata, M. Kosuge, H. Jinbo, T. Ito

Society of Photo-optical Instrumentation Engineers

1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12