Deep Anisotropic Etching Of GaAs With Chlorine- Based Chemistries And SU-8 Mask Using RIE And High Density ICP Etching Methods

Deep Anisotropic Etching Of GaAs With Chlorine- Based Chemistries And SU-8 Mask Using RIE And High Density ICP Etching Methods

Author(s):

Chiang, Yuh-Min (Johnson)

Publication title:

BioMEMS and bionanotechnology : symposium held April 1-3, 2002, San Francisco, California, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

729

Pub. Year:

2002

Page(from):

77

Page(to):

164

Pages:

94

Pub. info.:

Warrendale, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558996656 [1558996656]

Language:

English

Call no.:

M23500/729

Type:

Conference Proceedings

Details

TDL ID:	ZA00014602
Series ID:	PA00000011
Conf. info. (Name):	Symposium on biomems and bionanotechnology
Conf. info. (Number):	2002
Conf. info. (Venue):	San Francisco, CA, USA
Conf. info. (Date):	2002.04.01-2002.04.03

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