Functional Voids By Gas Ion Implantation For Applications In Semiconductor Processing
- Author(s):
- Publication title:
- Defect and impurity engineered semiconductors and devices III : symposium held April 1-5, 2002, San Francisco, California, U.S.A.
- Title of ser.:
- Materials Research Society symposium proceedings
- Ser. no.:
- 719
- Pub. Year:
- 2002
- Page(from):
- 205
- Page(to):
- 216
- Pages:
- 12
- Pub. info.:
- Warrendale, Pa: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558996656 [1558996659]
- Language:
- English
- Call no.:
- M23500/719
- Type:
- Conference Proceedings
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