Analysis Of Silicide/Diffusion Contact Resistance Making Use Of Transmission Line Structures

Analysis Of Silicide/Diffusion Contact Resistance Making Use Of Transmission Line Structures

Author(s):

Akheyar, Amal

Publication title:

Silicon materials - processing characterization and reliability : symposium held April 1-5, 2002, San Francisco, California, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

716

Pub. Year:

2002

Page(from):

53

Page(to):

58

Pages:

6

Pub. info.:

Warrendale: Materials Research Society

ISSN:

02729172

ISBN:

9781558996526 [1558996524]

Language:

English

Call no.:

M23500/716

Type:

Conference Proceedings

Details

TDL ID:	ZA00014589
Series ID:	PA00000011
Conf. info. (Name):	Symposium on silicon materials - processing characterization and reliability
Conf. info. (Number):	2002
Conf. info. (Venue):	San Francisco, CA, USA
Conf. info. (Date):	2002.04.01-2002.04.05

Similar Items:

1 Conference Proceedings Ni-Silicided Deep Source/Drain Junctions Formed by Solid Phase Epitaxial Regrowth Lauwers, Anne, Lindsay, Richard, Henson, Kirklen, Severi, Simone, Akheyar, Amal, Pawlak, Bartek J., Potter, Muriel de, … Materials Research Society	7 Conference Proceedings Effects of Alloying on Properties of NiSi for CMOS Applications Dal, Mark van, Akheyar, Amal, Kittl, Jorge A., Chamirian, Oxana, Potter, Muriel De, Demeurisse, Caroline, Lauwers, Anne, … Materials Research Society
2 Conference Proceedings Silicides for 65 nm CMOS and Beyond Kittl, Jorge A., Lauwers, Anne, Chamirian, Oxana, Dal, Mark Van, Akheyar, Amal, Richard, Olivier, Lisoni, Judit G., … Materials Research Society	8 Conference Proceedings Electrical Performance and Scalability of Ni-Monosilicide Towards sub 0.13 μm Technologies Lauwers, Anne, Potter, Muriel de, Lindsay, Richard, Steegen, An, Roelandts, Nico, Loosen, Fred, Vrancken, Christa, Maex, … Materials Research Society
3 Conference Proceedings Applications of Ni-Based Silicides to 45 nm CMOS and Beyond Kittl, Jorge A., Lauwers, Anne, Chamirian, Oxana, Pawlak, Malgorzata A., Dal, Mark Van, Akheyar, Amal, Potter, Muriel … Materials Research Society	9 Conference Proceedings Electrical Activity of B and As Segregated at the Si-SiO2 Interface Fruhauf, Jens, Lindsay, Richard, Bergmaier, Andreas, Vandervorst, Wilfried, Tempel, Georg, Maex, Karen, Dollinger, … Materials Research Society
4 Conference Proceedings 26 Co-silicide, Co(Ni)-silicide and Ni-silicide to source¥drain contact resistance Akheyar, A., Lauwers, A., Kitti, J.A., De Potter, M, Chamirian, O., Jonckheere, R., Leunissen, P., van Dal, M, Lindsay, … Electrochemical Society	10 Conference Proceedings The Control and Impact of Processing Ambient During RTP Maex, Karen, Kondoh, Eiichi, Lauwers, Anne, DePotter, Muriel, Prost, Joris MRS - Materials Research Society
5 Conference Proceedings Ni Silicide Morphology On Small Features Chamirian, Oxana, Lauwers, Anne, Kittl, Jorge A., Dal, Mark Van, Potter, Muriel De, Vrancken, Christa, Lindsay, Richard, … Materials Research Society	11 Conference Proceedings 23 Ni-based silicides: material issues for advanced CMOS applications Kittl, J.A., Lauwers, A., Chamirian, O., Van Dal, M, Akheyar, A., Richard, O., Lisoni, J.G., De Potter, M, Lindsay, R., … Electrochemical Society
6 Conference Proceedings Linewidth Dependence Of The Reverse Bias Junction Leakage For Co-Silicided Source/Drain Junctions Lauwers, Anne, Potter, Muriel de, Lindsay, Richard, Chamirian, Oxana, Demeurisse, Caroline, Vrancken, Christa, Maex, … Materials Research Society	12 Conference Proceedings 22 Silicide scaling: Co, Ni or CoNi? Lauwers, A., Kitti, IA., Akheyar, A., Van Dal, M, Chamirian, O., de Potter, M, Lindsay, R., Muex, K. Electrochemical Society

1

2

3

4

5

6

7

8

9

10

11

12