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Low Energy Plasma Enhanced Chemical Vapour Deposition--Plasma Enhanced Deposition of Epitaxial Si and SiGe

Author(s):
Rosenblad, Carsten
Kummer, Matthias
Deller, Hans-Rudolf
Graf, Thomas
Dommann, Alex
Hackbarth, Thomas
Hock, Georg
Muller, Elisabeth
Kanel, Hans von
4 more
Publication title:
Current issues in heteroepitaxial growth--stress relaxation and self assembly : symposium held November 26-29, 2001, Boston, Massachusetts, U.S.A
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
696
Pub. Year:
2002
Page(from):
131
Page(to):
142
Pages:
12
Pub. info.:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558996328 [155899632X]
Language:
English
Call no.:
M23500/696
Type:
Conference Proceedings

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