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A Self-Aligned Silicide Process for Thin Silicon-on-Insulator MOSFETs and Bulk MOSFETs With Shallow Junctions

Author(s):
Cohen, G.M.
Cabral, C., Jr.
Lavoie, C.
Solomon, P.M.
Guarini, K.W.
Chan, K.K.
Roy, R.A.
2 more
Publication title:
Materials issues in novel si-based technology : symposium held November 26-28, 2001, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
686
Pub. Year:
2002
Page(from):
89
Page(to):
94
Pages:
6
Pub. info.:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558996229 [1558996222]
Language:
English
Call no.:
M23500/686
Type:
Conference Proceedings

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