Diffusion Behavior of Ion-Implanted n-type Dopants in Silicon Germanium
- Author(s):
- Publication title:
- Materials issues in novel si-based technology : symposium held November 26-28, 2001, Boston, Massachusetts, U.S.A.
- Title of ser.:
- Materials Research Society symposium proceedings
- Ser. no.:
- 686
- Pub. Year:
- 2002
- Page(from):
- 33
- Page(to):
- 38
- Pages:
- 6
- Pub. info.:
- Warrendale, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558996229 [1558996222]
- Language:
- English
- Call no.:
- M23500/686
- Type:
- Conference Proceedings
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