Direct Formation of C54 Phase on the Basis of C40 TiSi2 and Its Applications in Deep Sub-Micron Technology
- Author(s):
Chen, S.Y. Shen, Z.X. Xu, S.Y. See, A.K. Chan, L.H. Li, W.S. - Publication title:
- Gate stack and silicide issues in silicon processing II : symposium held April 17-19, 2001, San Francisco, California, U.S.A.
- Title of ser.:
- Materials Research Society symposium proceedings
- Ser. no.:
- 670
- Pub. Year:
- 2002
- Pages:
- 6
- Pub. info.:
- Warrendale, PA: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558996069 [1558996060]
- Language:
- English
- Call no.:
- M23500/670
- Type:
- Conference Proceedings
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