Properties of Large Grain-Size Poly-Si Films by Catalytic Chemical Sputtering

Properties of Large Grain-Size Poly-Si Films by Catalytic Chemical Sputtering

Author(s):

Publication title:

Amorphous and heterogeneous silicon-based films - 2001 : symposium held April 16-20, 2001, San Francisco, California, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

664

Pub. Year:

2001

Pages:

6

Pub. info.:

Warrendale: Materials Research Society

ISSN:

02729172

ISBN:

9781558996007 [1558996001]

Language:

English

Call no.:

M23500/664

Type:

Conference Proceedings

Details

TDL ID:	ZA00014547
Series ID:	PA00000011
Conf. info. (Name):	Symposium on amorphous and heterogeneous silicon-based films
Conf. info. (Number):	2001
Conf. info. (Venue):	San Francisco, CA, USA
Conf. info. (Date):	2001.04.16-2001.04.20

Similar Items:

1 Conference Proceedings Electrical and Structural Properties of Catalytic-Nitrided SiO2 Films Izumi, Akira, Sato, Hidekazu, Matsumura, Hideki Materials Research Society	7 Conference Proceedings 200°C Preparation of SiNx Passivation Films for PZT Ferroelectric Capacitors by Catalytic CVD Minamikawa, Toshiharu, Yonezawa, Yasuto, Fujimori, Yoshikazu, Nakamura, Talashi, Masuda, Atsushi, Matsumura, Hideki Materials Research Society
2 Conference Proceedings Recent Progress In Industrial Applications of Cat-CVD (Hot-Wire CVD) Masuda, Atsushi, Izumi, Akira, Umemoto, Hironobu, Matsumura, Hideki Materials Research Society	8 Conference Proceedings CAT-CVD Process and its Application to Preparation of Si-Based Thin Films Izumi, A., Masuda, A., Matsumura, H. Materials Research Society
3 Conference Proceedings Low Temperature Nitridation Of SiO2 Films Using A Catalytic-CVD System Izumi, Akira, Sato, Hidekazu, Matsumura, Hideki Materials Research Society	9 Conference Proceedings Properties of High Quality p-Type Micro-Crystalline-Si Prepared by Cat-CVD Matsumura, Hideki, Katouno, Kouichi, Itoh, Masaya, Masuda, Atsushi Materials Research Society
4 Conference Proceedings Low-temperature direct-oxidation of Si using activated oxygen generated by tungsten catalytic reaction Kudo, Manabu, Izumi, Akira, Matsumura, Hideki MRS-Materials Research Society	10 Conference Proceedings Properties of Silicon Nitride Films Prepared by Combination of Catalytic-Nitridation and Catalytic-CVD Izumi, A., Kikkawa, A., Higashimine, K., Matsumura, H. Materials Research Society
5 Conference Proceedings Preparation of high-quality ultra-thin gate dielectrics by Cat-CVD and catalytic anneal Sato, Hidekazu, Izumi, Akira, Matsumura, Hideki MRS-Materials Research Society	11 Conference Proceedings Low-Temperature Formation of Device-Quality Polysilicon Films by CAT-CVD Method Matsumura, Hideki, Heya, Akira, Iizuka, Ritsuko, Izumi, Akira, He, An-Qiang, Otsuka, Nobuo MRS - Materials Research Society
6 Conference Proceedings Guide for Low-Temperature and High-Rate Deposition of Device Quality Polysilicon Films by Cat-CVD Method Heya, Akira, Nakata, Kazuhisa, Izumi, Akira, Matsumura, Hideki MRS - Materials Research Society	12 Conference Proceedings Effects of Active ammonia Gas cracked in catalytic-CVD on PZT ferroelectric capacitors Minimikawa, Toshiharu, Yonezawa, Yasuto, Fujimori, Yoshikazu, Nakamura, Takashi, Masuda, Atsushi, Matsumura, Hideki MRS-Materials Research Society

1

2

3

4

5

6

7

8

9

10

11

12