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Films and Devices Deposited by HWCVD at Ultra High Deposition Rates

Author(s):
Mahan, A.H.
Xu, Y.
Iwaniczko, E.
Williamson, D.L.
Beyer, W.
Perkins, J.D.
Vanecek, M.
Gedvilas, L.M.
Nelson, B.P.
4 more
Publication title:
Amorphous and heterogeneous silicon-based films - 2001 : symposium held April 16-20, 2001, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
664
Pub. Year:
2001
Pages:
6
Pub. info.:
Warrendale: Materials Research Society
ISSN:
02729172
ISBN:
9781558996007 [1558996001]
Language:
English
Call no.:
M23500/664
Type:
Conference Proceedings

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