Nanolithography by Electron Beam Resist-Trimming Technique

Nanolithography by Electron Beam Resist-Trimming Technique

Author(s):

Maeda, Tatsuro

Publication title:

Nonlithographic and lithographic methods of nanofabrication--from ultralarge-scale integration to photonics to molecular electronics : symposium held November 26-December 1, 2000, Boston, Massachusetts, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

636

Pub. Year:

2001

Pages:

6

Pub. info.:

Warrendale, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558995468 [1558995463]

Language:

English

Call no.:

M23500/636

Type:

Conference Proceedings

Details

TDL ID:	ZA00014523
Series ID:	PA00000011
Conf. info. (Name):	Symposium on nonlithographic and lithographic methods of nanofabrication
Conf. info. (Number):	2000
Conf. info. (Venue):	Boston, MA, USA
Conf. info. (Date):	2000.11.26-2000.12.01

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