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Chemical Routes to Improved Mechanical Properties of PECVD Low-k Thin Films

Author(s):
Bilodeau, S.M.
Borovik, A.S.
Ebbing, A.A.
Vestyck, D.J.
Xu, C.
Roeder, J.F.
Baum, T.H.
2 more
Publication title:
Materials, technology and reliability for advanced interconnects and low-k dielectrics - 2004 : symposium held April 13-15, 2004, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
812
Pub. Year:
2004
Page(from):
109
Page(to):
116
Pages:
8
Pub. info.:
Warrendale: Materials Research Society
ISSN:
02729172
ISBN:
9781558997622 [1558997628]
Language:
English
Call no.:
M23500/812
Type:
Conference Proceedings

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