Comparative Studies of Ultra Low-k Porous Silica Films With 2D Hexagonal and Disordered Pore Structures

Comparative Studies of Ultra Low-k Porous Silica Films With 2D Hexagonal and Disordered Pore Structures

Author(s):

Fujii, Nobutoshi

Publication title:

Materials, technology and reliability for advanced interconnects and low-k dielectrics - 2004 : symposium held April 13-15, 2004, San Francisco, California, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

812

Pub. Year:

2004

Page(from):

43

Page(to):

48

Pages:

6

Pub. info.:

Warrendale: Materials Research Society

ISSN:

02729172

ISBN:

9781558997622 [1558997628]

Language:

English

Call no.:

M23500/812

Type:

Conference Proceedings

Details

TDL ID:	ZA00014454
Series ID:	PA00000011
Conf. info. (Name):	Symposium on materials, technology and reliability for advanced interconnects and low-k dielectrics
Conf. info. (Number):	2004
Conf. info. (Venue):	San Francisco, CA, USA
Conf. info. (Date):	2004.04.13-2004.04.15

Similar Items:

1 Conference Proceedings Advanced Characterization of Ultra-Low-k Periodic Porous Silica Films: Pore Size Distribution, Pore-Diameter Anisotropy, and Size and Macroscopic Isotropy of … Hata, N., Negoro, C., Takada, S., Yamada, K., Oku, Y., Kikkawa, T. Materials Research Society	7 Conference Proceedings A Novel Organosiloxane Vapor Annealing Process for Improving Elastic Modulus of Porous Low-k Films Kohmura, Kazuo, Oike, Shunsuke, Murakami, Masami, Tanaka, Hirofumi, Takada, Syozo, Seino, Yutaka, Kikkawa, Takamaro Materials Research Society
2 Conference Proceedings A New Approach Of Thin-Film X-Ray Diffraction / Scattering Analysis For Ultra-Low-K Dielectrics With Periodic Pore Structures Hata, N., Oku, Y., Yamada, K., Kikkawa, T. Materials Research Society	8 Conference Proceedings Effect of Plasma Treatment and TMCTS Vapor Annealing on the Reinforcement of Porous Low-k Films Kohmure, Kazuo, Tanaka, Hirofilmi, Oike, Shunsnke, Murakami, Masami, Ono, Tetsuo, Seino, Yutaka, Kikkawa, Takamaro Materials Research Society
3 Conference Proceedings Novel Periodic Nanoporous Silicate Glass With High Structural Stability As Low-K Thin Film Oku, Yoshiaki, Nishiyama, Norikazu, Tanaka, Shunsuke, Ueyama, Korekazu, Hata, Nobuhiro, Kikkawa, Takamaro Materials Research Society	9 Conference Proceedings Evaluation of Ultra-thin Layer Fabricated by Wet-process as a Pore-seal for Porous Low-k Films Shoko Sugiyama Ono, Kazuo Kohmura, Hirofumi Tanaka, Yasuhisa Kayaba, Takamaro Kikkawa Materials Research Society
4 Conference Proceedings Characteristics of Self-Assembled Ultra-Low-k Porous Silica Films Oku, Y., Fujii, N., Kohmura, K., Yamada, K., Hata, N., Seine, Y., Ichikawa, R., Nishiyama, N., Tanaka, S., Miyoshi, H., … Electrochemical Society	10 Conference Proceedings Fabrication of mesoporous silica for ultra-low-k interlayer dielectrics (Invited Paper) [6002-24] Fujii N., Kkohmura K., Nakayama T., Tanaka H., Hata N., 0, Kikkawa T. SPIE - The International Society of Optical Engineering
5 Conference Proceedings Evaluation of Copper Ion Drift in Low-Dielectric-Constant Interlayer Films by Transient Capacitance Spectroscopy Yoshino, Takenobu, Hata, Nobuhiro, Kikkawa, Takamaro Materials Research Society	11 Conference Proceedings Self-assembled porous silica/Cu damascene interconnects for 45nm node and beyond (invited Papre) [6002-23] Kikkawa T., Yagi R., Chikaki S., Shimoyama M., Ono T., Fujii N., Kohmura K., Tanaka H., Nakayama T., Ishikawa A., Motsuo … SPIE - The International Society of Optical Engineering
6 Conference Proceedings Self-assembled ultralow-k porous silica films for 45-nm node technology (Invited Paper) Kikkawa, T., Oku, Y., Kohmura, K., Fujii, N., Tanaka, H., Ishikawa, A., Matsuo, H., Sonoda, Y., Miyoshi, H., Goto, T., … SPIE - The International Society of Optical Engineering	12 Conference Proceedings Photosensitive porous low-k interlayer dielectric film Kuroki, S. -I., Kikkawa, T. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12