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Study of Pulsed RF DPN Process Parameters for 65 um node MOSFET Gate Dielectrics

Author(s):
Rothschild, A.
Kraus, P.A.
Chua, T.C.
Nouri, F.
Cubaynes, F.N.
Veloso, A.
Mertens, S.
Date, L.
Schreutelkamp, R.
Schaekers, M.
5 more
Publication title:
Integration of advanced micro- and nanoelectronic devices - critical issues and solutions : symposium held April 13-16, 2004, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
811
Pub. Year:
2004
Page(from):
49
Page(to):
56
Pages:
8
Pub. info.:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558997615 [155899761X]
Language:
English
Call no.:
M23500/811
Type:
Conference Proceedings

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