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External rf Substrate Biasing During a-Si:H Film Growth Using the Expanding Thermal Plasma Technique

Author(s):
Publication title:
Amorphous and nanocrystalline silicon science and technology - 2004 : symposium held April 13-16, 2004, San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
808
Pub. Year:
2004
Page(from):
383
Page(to):
388
Pages:
6
Pub. info.:
Warrendale: Materials Research Society
ISSN:
02729172
ISBN:
9781558997585 [155899758X]
Language:
English
Call no.:
M23500/808
Type:
Conference Proceedings

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