Pulsed Laser Deposition Parameter Optimization for Growth of Alumina (Al2O3) Thin Film on Silicon (100)

Pulsed Laser Deposition Parameter Optimization for Growth of Alumina (Al2O3) Thin Film on Silicon (100)

Author(s):

Publication title:

Continuous nanophase and nanostructured materials : symposium held December 1-5, 2003, Boston, Masachusetts, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

788

Pub. Year:

2004

Page(from):

577

Page(to):

582

Pages:

6

Pub. info.:

Warrendale, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558997264 [1558997261]

Language:

English

Call no.:

M23500/788

Type:

Conference Proceedings

Details

TDL ID:	ZA00014445
Series ID:	PA00000011
Conf. info. (Name):	Symposium on continuous nanophase and nanostructured materials
Conf. info. (Number):	2003
Conf. info. (Venue):	Boston, MA, USA
Conf. info. (Date):	2003.12.01-2003.12.05

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