Study of Metal Gate Work Function Modulation Using Plasma and SiH4 Treated TiN Thin Films

Study of Metal Gate Work Function Modulation Using Plasma and SiH4 Treated TiN Thin Films

Author(s):

Fillot, F.

Publication title:

Fundamentals of novel oxide/semiconductor interfaces : symposium held December 1-4, 2003, Boston, Massachusetts, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

786

Pub. Year:

2004

Page(from):

259

Page(to):

266

Pages:

8

Pub. info.:

Warrendale, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558997240 [1558997245]

Language:

English

Call no.:

M23500/786

Type:

Conference Proceedings

Details

TDL ID:	ZA00014443
Series ID:	PA00000011
Conf. info. (Name):	Symposium on fundamentals of novel oxide
Conf. info. (Number):	2003
Conf. info. (Venue):	Boston, MA, USA
Conf. info. (Date):	2003.12.01-2003.12.04

Similar Items:

1 Conference Proceedings Study of Work Function of CVD WSix Thin Film on High-k Dielectric Maitrejean, S., Allegret, S., Fillot, F., Farjot, T., Guillaumot, B., Passemard, G. Materials Research Society	7 Conference Proceedings Miniaturized tin oxide(SnOx)sensor by using oxygen-plasma-treated thin film technique Lian,K., Ling,Z.G., Jiang,J.C. SPIE - The International Society for Optical Engineering
2 Conference Proceedings Mechanical Properties of Porous MSQ Films: Impact of the Porogen Loading and Matrix Crosslinking. Ciaramella, F., Jousseaume, V., Maitrejean, S., Remiat, B., Verdier, M., Passemard, G. Materials Research Society	8 Conference Proceedings Nickel Silicide Work Function Tuning Study In Metal-Gate CMOS Applications Yuan, Jun, Pan, Grant Z., Chao, Yu-Lin, Woo, Jason C. S. Materials Research Society
3 Conference Proceedings Investigation of Mechanical Properties of Mesoporous Methyl-Substituted SiO2 Thin Films(Methylsilesquioxane Materials) Verdier, M., Montagnat, M., Maitrejean, S., Passemard, O. Materials Research Society	9 Conference Proceedings CMP-Induced Peeling in Multi-Level Ultra Low-k/Cu Interconnects Leduc, Patrick, Farjot, Thierry, Savoye, Mylene, Demas, Anne-Cecile, Maitrejean, Sylvain, Passemard, Gerard Materials Research Society
4 Conference Proceedings DAMASCENE METAL GATE FOR 70 nm CMOS PROCESS Guillaumot, B., Ducroquet, F., Ernst, T., Guegan, G., Galon, C., Renard, C., PrevitaIi, B., Rivoire, M., Nier, M.E., … Electrochemical Society	10 Conference Proceedings Highly Reliable Metal Gate nMOSFETs by Improved CVD-WSix Films With Work Function of 4.3eV Nakajima, Kazuaki, Nakazawa, Hiroshi, Sekine, Katsuyuki, Matsuo, Kouji, Saito, Tomohiro, Katata, Tomio, Suguro, Kyoichi, … Materials Research Society
5 Conference Proceedings DAMASCENE METAL GATE FOR 70 nm CMOS PROCESS Guillaumot, B., Ducroquet, F., Ernst, T., Guegan, G., Galon, C., Renard, C., PrevitaIi, B., Rivoire, M., Nier, M.E., … Electrochemical Society	11 Conference Proceedings Nondestructive chemical identification using an x-ray transmission function obtained with the multi-energy method Maitrejean,S., Perion,D., Sundermann,D. SPIE-The International Society for Optical Engineering
6 Conference Proceedings Introducing Advanced ULK Dielectric Mateials in Interconnects: Performance and Integration Challenges Fusalba, F., Cornec, C.Le, Maury, P., Remiat, B., Jousseaume, V., Haxaire, K., Mourier, T., Haumesser, P.H, Maitrejean, … Electrochemical Society	12 Conference Proceedings Work Function Study of Polycrystalline Metals Using a UHV Scanning Kelvin Probe Petermann, U., Baikie, I.D., Lagel, B., Dirscherl, K.M. Materials Research Society

1

2

3

4

5

6

7

8

9

10

11

12