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Conductance Transient Comparative Analysis of ECR-PECVD Deposited SiNx, SiO2/SiNx and SiOxNy Dielectric Films on Silicon Substrates

Author(s):
Castan, H.
Duenas, S.
Barbolla, J.
Del Prado, A.
San Andres, E.
Martil, I.
Gonzalez-Diaz, G.
2 more
Publication title:
Fundamentals of novel oxide/semiconductor interfaces : symposium held December 1-4, 2003, Boston, Massachusetts, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
786
Pub. Year:
2004
Page(from):
83
Page(to):
88
Pages:
6
Pub. info.:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558997240 [1558997245]
Language:
English
Call no.:
M23500/786
Type:
Conference Proceedings

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