Resist Poisoning-Free Advanced PECVD-Based Anti-Reflective Coating (ARC) for 90 nm Technology and Beyond

Resist Poisoning-Free Advanced PECVD-Based Anti-Reflective Coating (ARC) for 90 nm Technology and Beyond

Author(s):

Ahn, Sang H.

Publication title:

Micro- and nanosystems : symposium held December 1-3, 2003, Boston, Massachusetts, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

782

Pub. Year:

2004

Page(from):

363

Page(to):

370

Pages:

8

Pub. info.:

Warrendale, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558997202 [1558997202]

Language:

English

Call no.:

M23500/782

Type:

Conference Proceedings

Details

TDL ID:	ZA00014439
Series ID:	PA00000011
Conf. info. (Name):	Symposium on micro- and nanosystems
Conf. info. (Number):	2003
Conf. info. (Venue):	Boston, MA, USA
Conf. info. (Date):	2003.12.01-2003.12.03

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